Photogile POU Filter for Lithography Process

One-piece construction is easy to install, clean and replace this filter capsule


Unique vent structure effectively removes bubbles in the photoresist


Available in a wide range of membranes to meet all customer requirements


Strict Japanese quality assurance ensures product stability






  • Specification
  • Performance
  • Ordering Information


Product Specification

Filter Membrane UPE / Nylon / Multi/ HAPES / PTFE
Cage / Core / End CapsHDPE 

Max. Operating Temperature

50°C





Ordering Information


Catridge

PTG123456



Block 1Block 2Block 3Block 4Block 5Block 6

Membrane

Removal Ratings    

Configuration

O-ring MaterialCleanlinessPackage 
U=UPE

NM01=1nm

NM02=2nm

NM03=3nm

NM05=5nm

NM10=10nm

NM20=20nm

NM30=30nm

NM50=50nm

0010=0.1μm

0020=0.2μm

SIN=Side Inlet

CIN=Center Inlet


K=FFKM

KZ=Kalrez

UU= Super clean grade

UH= High clean grade

U= Semicon grade

E= Electronic grade

D=Dry

W=Prewet, UPW

N=Nylon

NM02=2nm

NM05=5nm

NM10=10nm

NM20=20nm

NM40=40nm

0010=0.1μm

0020=0.2μm





M=Multi

NM02=2nm

NM03=3nm

NM05=5nm

NM10=10nm

NM20=20nm

NM30=30nm

NM50=50nm

0010=0.1μm

0020=0.2μm





P=HAPES

NM02=2nm

NM05=5nm

NM10=10nm

NM20=20nm

NM30=30nm

NM50=50nm

0010=0.1μm





F=PTFE 





NM07=7nm

NM10=10nm

NM15=15nm

NM20=20nm

NM30=30nm

NM50=50nm

0010=0.1μm

0020=0.2μm

0050=0.5μm








Please contact Cobetter for additional information.



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